EECS 290H: Special Issues in Semiconductor Manufacturing
This course addresses the issue of transfering novel IC technologies to
production. Five main topics will be covered:
The course is self-contained for the student whose background includes
IC processing (EE143) and basic IC design (EE140 or EE141).
Integrated circuits and fabrication processes must be designed for optimum
manufacturability. We will address this issue by discussing several Design
for Manufactura bility techniques and tools.
Experimental design techniques are used to optimize an IC fabrication process.
We will discuss techniques ranging from simple comparison of treatments
to complex multivariate response surface analysis.
The widespread application of statistical control in IC production is a
major strategic goal for the 1990s. We will cover operator-oriented statistical
control methods, as well as novel computer-automated algorithms.
In-line and in-situ sensors for semiconductor process characterization
Computer-Aided Manufacturing Infrastructure.
Final Reports Presentation Party
(Tuesday 5/18, 12:30 - 3ish, Hogan Room)
See news group on presentation instructions and grading considerations.
Make sure that you get your report to C. Spanos by Sunday 5/16.
Professor Costas J. Spanos
Phone: 510 643 6776 Fax 642 2739
Professor Kameshwar Poolla
Phone: 510 642-4642 Fax 643 5599
Place and Time
Class: 12:30 - 2:00 Tu and Th in 541 Cory
Office Hours: 1 - 2pm Monday and Wednesday in 568 Cory
Available Information (Available on the weekend prior to lectures)
Last Updated January 14 1999
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