EECS 290H: Special Issues in Semiconductor Manufacturing
Spring, 1999
This course addresses the issue of transfering novel IC technologies to
production. Five main topics will be covered:
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Integrated circuits and fabrication processes must be designed for optimum
manufacturability. We will address this issue by discussing several Design
for Manufactura bility techniques and tools.
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Experimental design techniques are used to optimize an IC fabrication process.
We will discuss techniques ranging from simple comparison of treatments
to complex multivariate response surface analysis.
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The widespread application of statistical control in IC production is a
major strategic goal for the 1990s. We will cover operator-oriented statistical
control methods, as well as novel computer-automated algorithms.
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In-line and in-situ sensors for semiconductor process characterization
and control.
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Computer-Aided Manufacturing Infrastructure.
The course is self-contained for the student whose background includes
IC processing (EE143) and basic IC design (EE140 or EE141).
Final Reports Presentation Party
(Tuesday 5/18, 12:30 - 3ish, Hogan Room)
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See news group on presentation instructions and grading considerations.
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Make sure that you get your report to C. Spanos by Sunday 5/16.
Teaching Staff
Professor Costas J. Spanos
E-mail: spanos@eecs.berkeley.edu
Phone: 510 643 6776 Fax 642 2739
Professor Kameshwar Poolla
E-mail: poolla@jagger.me.berkeley.edu
Phone: 510 642-4642 Fax 643 5599
Place and Time
Class: 12:30 - 2:00 Tu and Th in 541 Cory
Office Hours: 1 - 2pm Monday and Wednesday in 568 Cory
Available Information (Available on the weekend prior to lectures)
Last Updated January 14 1999
Comments to spanos@eecs.berkeley.edu
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