ANNOUNCEMENTS:

23 May 2009

• Check the histograms for Lab report 1, report 2, and the Final exam.

18 May 2009

• Final Exam review session will be held at 8pm on Tue, 19 May at 521 Cory (Hogan room).
• Review material is posted in exam section.
• The final exam is scheduled to take place in 277 Cory Hall from 12:30-3:30 pm on Thursday, May 21, 2009

1 May 2009

• "Principles of Semiconductor Devices" is posted in Additional Course Material section.
• Homework #3 on device physics posted. Not for credit.
• Additional office hour in the lab (218 Cory): Tue 5-6pm. This is the LAST chance to measure for the lab report 2.

28 Apr. 2009

• Thursday, May. 7, 2009, Last day of class: Lab report 2 due at the beginning of class.

16 Apr. 2009

• Exam 2 solution posted

14 Apr. 2009

• Exam 2 review session will be held at 6:30pm on 15 Apr. at 310 Soda.
• Review material is posted in exam section.
• Outline for exam 2
• HW2 solution posted

13 Apr. 2009

• Hint for problem 7 is posted.

9 Apr. 2009

• Clarification of HW2 is posted.

7 Apr. 2009

• Homework 2 is posted. It's due on 4/14.

27 Feb. 2009

• Regrading done. The grades updated at bSpace, histogram also updated.

26 Feb. 2009

• The exam1 average and the standard deviation are 87 and 5.79, respectively. Histogram is posted in exam section.

23 Feb. 2009

• Exam review session will be held at 6:30pm today at 521 Cory. Reviewed material is posted in "exams" section.
• Review solution posted

21 Feb. 2009

• HW1 solution updated
• Exam review will be held at 6pm on Mon. Feb. 23. The place will be posted.

17 Feb. 2009

• Exam 1 is on Feb 24. Sample exam is posted in "Exams & Quizzes" section.

12 Feb. 2009

• Homework 1 is posted. It's due on 2/19.
• Additional reading materials are posted. To access the restricted folder, you will need username and password announced via email.
• There will be Microlab tours served next week at Wed 2pm, Thu 11am, and Fri 9am.

5 Feb. 2009

• Remote simulation with the LAVA website for classroom use: Click here
• 1. Click on "Presentations" -> Click EE143 -> There are three presentations of approximately 30 min each.
• 2. Click on "Applications" -> Click "Basic Processes and Concepts" ->
• A. Basic Projection Lithography is suitable for studying basic feature types, focus effects and even annular illumination.
• B. Line End Quality is suitable for comparing 2D line ends with images of lines.
• C. Resist Development rate curve is suitable for exploring how the shape of the image and dissolution rate play together to form the line edge profile (follow the instruction on the bottom).
• D. Resist Development Profile is not ready yet, as we are debugging the link to SAMPLE.

31 Jan. 2009

• Please read lab manual.
• lab quizzes every week